02835356097 | info@hnfcons.com.vn|
  • Tiếng ViệtTiếng Việt
  • Site Map
H&F Consulting – Righteous & VictoriousH&F Consulting – Righteous & Victorious
Generic selectors
Exact matches only
Search in title
Search in content
Search in posts
Search in pages
  • Who We Are
    • About H&F Consulting
    • Corporate Social Responsibility
    • Message from H&F President
  • Solutions
    • Surface-mount technology (SMT)
      • Printer
      • Mounter
      • AOI
      • SPI
      • Spare part: Feeder, Nozzle,…
      • Loader
      • Unloader
      • Reflow oven
      • Conveyor
      • Magazine
    • Industrial Engineering
      • Semiconductor
        • Materials & Consumables
        • Machineries & Equipment Accessories
        • Components
      • Photonics
        • Photonics Devices & Solution – Application
        • Color management
      • Fabrication
      • Clean-room materials and equipment
    • Research Labs
  • Services
    • Semicon, Photonix related
      • Installations
      • Relocation
      • Consultations
      • Repair
      • Periodical Maintenance
  • New ProductsNew
    • Bare wafer
    • Probe and Pogo Pin
    • TOSE Surfactant solution
    • Spectrophotometer
  • News
  • CareerUrgent
  • Contact Us
Solder Ball Cleaner (AMT 5913)

Cleaning Machine

DEV2019-01-11T15:34:16+07:00

Cleaning Machine

ARIATec provides cleaning machines to use for semiconductor industrial . The following is the products that we supply.

Contact us

Close
  • Hermes Epitek
  • Fully Automatic Wafer Cleaning Machine (ENF)
AMT-5913
Solder Ball Cleaner (AMT 5913)

Solder Ball Cleaner (AMT 5913)

Equipment outline

This system is cleaning the reflow residue by Air+D.I Water and drying by Halogen Lamp and air blower.

Main Feature
  • Target Strip : W 75mm / L 280mm
  • Parallel : 4 Site para Clean & Dry
  • Cycle Time : 13 sec / 1 strip
  • Throughput : Max. 40,000 UPH ( 85% Efficiency ) ( 150 Device / 1 Strip )
  • Loading / Unloading:
    • Loading – 4 pitch roller
    • Unloading – Magazine Elevator
    • Buffer – Maker Magazine ( 40ea ) Elevator

Close
VerSum Ultra Cleaning System
VerSum Ultra Cleaning System

VerSum Ultra Cleaning System

Equipment outline

This system is specializes in Wafer Carrier Cleaning and parts cleaning.

Cassette, Box, SMIF and FOUP cleaning.

Main Feature

Cleaning Systems for Wafer Carriers

  • 300MM FOUPs: Entegris F300, Asyst A300, SEP FOUP.
  • 300MM FOSBs: Kakizaki, MW300, CrystalPak, SEP FOSB.
  • 200MM SMIF POD.
  • 4”, 6” and 8” Carriers: UltraPak, SEP E99.

Close
VerSum GSS Acid Cleaning Station
VerSum GSS Acid Cleaning Station

VerSum GSS Acid Cleaning Station

Equipment outline

Acid Cleaning Station is a self-contained, fully automatic system designed to acid clean and rinse exhaust lines and other parts using precise preprogrammed recipes.

Main Feature

Sink:

  • 74” left to right, 24” front to rear, and 18” deep. Total approximate depth for acid is 12”, and 18” for rinse water. The total sink volume is 138 gallons.

Footprint:

  • Measures 114” left to right, 60” front to rear, and 79” high.

Close
VerSum Vertical Furnace Quartzware Cleaner
VerSum Vertical Furnace Quartzware Cleaner

VerSum Vertical Furnace Quartzware Cleaner

Equipment outline

The Vertical Furnace Quartzware Cleaner is an automatic, self-contained system used to safely and automatically clean vertical furnace quartzware utilizing both a spray (for tubes) and an immersion bath (smaller components).

Main Feature
  • 2 tubes cleaning station, 1 with rotating spray and the other with semi-auto halo fixture.
  • Immersion bath for smaller component.
  • Able to clean process tube, inner tube, boat, pedestal, T/C, Torch and accessories in one recipe.

Close
VerSum Typhoon Quartzware Cleaner
VerSum Typhoon Quartzware Cleaner

VerSum Typhoon Quartzware Cleaner

Equipment outline

The Typhoon offers a faster and cleaner process with improved cost of ownership. The tool provides two process chambers with simultaneous independent operation.

Main Feature
  • Independent and simultaneous operating chambers
  • No cross-contamination between the two chambers
  • 200mm and 300mm compatible
  • Reduced acid usage through spray process

Close
Fully Automatic Wafer Cleaning Machine
General Specification
  • Capable to clean up to 12″ wafer diameter.
  • Cleaning method: Air atomizing nozzle.
  • Cleaning program: >20
  • Table rotation: programmable 100-30,000 rpm.
  • Touch panel.
  • Porous type spinner table. (Option)

Related Products


Latest Hnfcons Tweets

Please configure widget options.

FacebookTwitter
© Copyright 2018. All Rights Reserved.

 

    02835356097 | info@hnfcons.com.vn
    • Who We Are
      • About H&F Consulting
      • Corporate Social Responsibility
      • Message from H&F President
    • Solutions
      • Surface-mount technology (SMT)
        • Printer
        • Mounter
        • AOI
        • SPI
        • Spare part: Feeder, Nozzle,…
        • Loader
        • Unloader
        • Reflow oven
        • Conveyor
        • Magazine
      • Industrial Engineering
        • Semiconductor
          • Materials & Consumables
          • Machineries & Equipment Accessories
          • Components
        • Photonics
          • Photonics Devices & Solution – Application
          • Color management
        • Fabrication
        • Clean-room materials and equipment
      • Research Labs
    • Services
      • Semicon, Photonix related
        • Installations
        • Relocation
        • Consultations
        • Repair
        • Periodical Maintenance
    • New ProductsNew
      • Bare wafer
      • Probe and Pogo Pin
      • TOSE Surfactant solution
      • Spectrophotometer
    • News
    • CareerUrgent
    • Contact Us
    • Tiếng ViệtTiếng Việt
    • Site Map